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Thursday 22 January 2015

45nm 32 nm 28nm 24nm 22nm ….. What Does It Mean?

Intel's new microprocessor relies on a new recipe that combines the element Hafnium and metal gate technology to increase performance and significantly reduce eco-unfriendly, wasteful electricity leaks. But what does that mean?

Semiconductor manufacturing processes
  • 10 µm — 1971
  • 3 µm — 1975
  • 1.5 µm — 1982
  • 1 µm — 1985
  • 800 nm (.80 µm) — 1989
  • 600 nm (.60 µm) — 1994
  • 350 nm (.35 µm) — 1995
  • 250 nm (.25 µm) — 1998
  • 180 nm (.18 µm) — 1999
  • 130 nm (.13 µm) — 2000
  • 90 nm — 2002
  • 65 nm — 2006
  • 45 nm — 2008
  • 32 nm — 2010
  • 22 nm — 2011
  • 16 nm — approx. 2013
  • 11 nm — approx. 2015
  • 6 nm — approx. 2020

Thursday 15 January 2015

List of companies for IC Fabrication in world with process technology (in nm)

List of  companies for IC Fabrication in world 

Company Name
Location
Process technology node  (in nm )
Plant start –up cost(in US $ billions )
Samsung
Soutn korea ,
20
10.2
Intel
USA
14
5
Global Foundries
Germany
45 and under
2.5
Silterra
Malayisa
90-180
1.6
Frescale Semiconductor
USA
180
1.1
Texas Instruments
South Portland
0.932
350
CNSE
USA
0.175
65
General Motoras
USA

500+
Fairchild
USA

350
SMIC
China

350
Megna Chip
South Korea

130
Cypress Semiconductor
USA

130
Tower Jazz
USA

130-500
Fujitsu
Japan

90
ST Microelectronics
France

45
MICRON
USA

25nm
Maxim
USA

200





Regards, 
VLSI Engi Tech Pvt. Ltd. 
www.vlsiengitech.com


Saturday 10 January 2015

Top Universities For MS in VLSI

Hello Everyone,
These are the Rankings of the Universities in USA for MS in VLSI. The Rankings have been taken from US University Rankings  and also from other websites.  Here is the list.

Rank Universities


1 Arizona State University
2 Boston University
3 Carnegie Mellon University
4 Case Western Reserve University
5 Clemson University
6 Columbia University
7 Concordia University
8 Drexel University
9 Duke University
10 Emory University
11 Fairleigh Dickinson University, Metropolitan
12 Florida International University
13 Harvard University
14 Illinois Institute of Technology
15 Iowa State University of Science and Tech
16 Lehigh University
17 New York University
18 North Carolina Agricultural and Technical State Univ
19 North Carolina State University
20 Northeastern University
21 Northwestern University
22 Oakland University
23 Oklahoma State University
24 Oregon State University
25 Polytechnic University, Brooklyn Campus
26 Princeton University
27 Purdue University
28 Rensselaer Polytechnic Institute
29 Rose-Hulman Institute of Technology
30 Rutgers, The State University of New Jersey, New Brunswick/Piscataway
31 Southern Illinois University Carbondale
32 Southern Methodist University
33 State University of New York at Binghamton
34 State University of New York at Buffalo
35 Stony Brook University, State University of New York
36 Syracuse University
37 Temple University
38 Texas A&M University
39 The George Washington University
40 The Johns Hopkins University
41 The Pennsylvania State University Harrisburg
42 The Pennsylvania State University -University Park
43 The University of Arizona
44 The University of North Carolina
45 The University of North Carolina at Chapel Hill
46 The University of Texas at Austin
47 The University of Texas at Dallas
48 Tufts University
49 Univ of Cincinnati
50 University at Buffalo, The State University of New York
51 University of California, Riverside
52 University of California, San Diego
53 University of California, Santa Cruz
54 University of Florida
55 University of Houston
56 University of Idaho
57 University of Illinois at Chicago
58 University of Louisiana at Lafayette
59 University of Maryland, Baltimore County
60 University of Michigan
61 University of Minnesota Twin Cities
62 University of Missouri–Rolla
63 University of Nebraska–Lincoln
64 University of New Mexico
65 University of North Texas
66 University of Notre Dame
67 University of Rochester
68 University of South Florida
69 University of Southern California
70 University of Washington
71 Virginia Commonwealth University
72 Virginia Polytechnic Institute and State University
73 Washington University in St. Louis
74 Wayne State University
75 Yale University

Wednesday 7 January 2015

Ultra Large-Scale Integration (ULSI)

Definition - What does Ultra Large-Scale Integration (ULSI) mean?

Ultra large-scale integration (ULSI) is the process of integrating or embedding millions of transistors on a single silicon semiconductor microchip. ULSI technology was conceived during the late 1980s when superior computer processor microchips, specifically for the Intel 8086 series, were under development. ULSI is a successor to large-scale integration (LSI) and very large-scale integration (VLSI) technologies but is in the same category as VLSI.

Techopedia explains Ultra Large-Scale Integration (ULSI)

ULSI was designed to provide the greatest possible computational power from the smallest form factor of microchip or microprocessor dye. This was achieved by embedding and integrating integrated circuits (IC), which were formed with transistors and logic gates. The close placement and design architecture enabled faster resolution of tasks and processes. However, even though VLSI now contains more than millions of transistors, any IC or microchip with more than one million transistors is considered a ULSI implementation.
Intel 486 and the Pentium series of processors were built on ULSI principles.

Monday 5 January 2015

The Future of Very Large-Scale Integration (VLSI) Technology

                            The historical growth of IC computing power has profoundly changed the way we create, process, communicate, and store information. The engine of this phenomenal growth is the ability to shrink transistor dimensions every few years. This trend, known as Moore’s law, has continued for the past 50 years. The predicted demise of Moore’s law has been repeatedly proven wrong thanks to technological breakthroughs (e.g., optical resolution enhancement techniques, high-k metal gates, multi-gate transistors, fully depleted ultra-thin body technology, and 3-D wafer stacking). However, it is projected that in one or two decades, transistor dimensions will reach a point where it will become uneconomical to shrink them any further, which will eventually result in the end of the CMOS scaling roadmap. This essay discusses the potential and limitations of several post-CMOS candidates currently being pursued by the device community.


                     Steep transistors: The ability to scale a transistor’s supply voltage is determined by the minimum voltage required to switch the device between an on- and an off-state. The sub-threshold slope (SS) is the measure used to indicate this property. For instance, a smaller SS means the transistor can be turned on using a smaller supply voltage while meeting the same off current. For MOSFETs, the SS has to be greater than ln(10) × kT/q where k is the Boltzmann constant, T is the absolute temperature, and q is the electron charge. This fundamental constraint arises from the thermionic nature of the MOSFET conduction mechanism and leads to a fundamental power/performance tradeoff, which could be overcome if SS values significantly lower than the theoretical 60-mV/decade limit could be achieved. Many device types have been proposed that could produce steep SS values, including tunneling field-effect transistors (TFETs), nanoelectromechanical system (NEMS) devices, ferroelectric-gate FETs, and impact ionization MOSFETs. Several recent papers have reported experimental observation of SS values in TFETs as low as 40 mV/decade at room temperature. These so-called “steep” devices’ main limitations are their low mobility, asymmetric drive current, bias dependent SS, and larger statistical variations in comparison to traditional MOSFETs.


                              Spin devices: Spintronics is a technology that utilizes nano magnets’ spin direction as the state variable. Spintronics has unique properties over CMOS, including nonvolatility, lower device count, and the potential for non-Boolean computing architectures. Spintronics devices’ nonvolatility enables instant processor wake-up and power-down that could dramatically reduce the static power consumption. Furthermore, it can enable novel processor-in-memory or logic-in-memory architectures that are not possible with silicon technology. Although in its infancy, research in spintronics has been gaining momentum over the past decade, as these devices could potentially overcome the power bottleneck of CMOS scaling by offering a completely new computing paradigm. In recent years, progress has been made toward demonstration of various post-CMOS spintronic devices including all-spin logic, spin wave devices, domain wall magnets for logic applications, and spin transfer torque magnetoresistive RAM (STT-MRAM) and spin-Hall torque (SHT) MRAM for memory applications. However, for spintronics technology to become a viable post-CMOS device platform, researchers must find ways to eliminate the transistors required to drive the clock and power supply signals. Otherwise, the performance will always be limited by CMOS technology. Other remaining challenges for spintronics devices include their relatively high active power, short interconnect distance, and complex fabrication process.


                             Flexible electronics: Distributed large area (cm2-to-m2) electronic systems based on flexible thin-film-transistor (TFT) technology are drawing much attention due to unique properties such as mechanical conformability, low temperature processability, large area coverage, and low fabrication costs. Various forms of flexible TFTs can either enable applications that were not achievable using traditional silicon based technology, or surpass them in terms of cost per area. Flexible electronics cannot match the performance of silicon-based ICs due to the low carrier mobility. Instead, this technology is meant to complement them by enabling distributed sensor systems over a large area with moderate performance (less than 1 MHz). Development of inkjet or roll-to-roll printing techniques for flexible TFTs is underway for low-cost manufacturing, making product-level implementations feasible. Despite these encouraging new developments, the low mobility and high sensitivity to processing parameters present major fabrication challenges for realizing flexible electronic systems.


                          CMOS scaling is coming to an end, but no single technology has emerged as a clear successor to silicon. The urgent need for post-CMOS alternatives will continue to drive high-risk, high-payoff research on novel device technologies. Replicating silicon’s success might sound like a pipe dream. But with the world’s best and brightest minds at work, we have reasons to be optimistic.

Friday 2 January 2015

Urgent requirment for MATLAB

Job Field :- MATLAB
company :- VLSI Engi Tech Pvt. Ltd.
Location :- Jaipur
Salary :- Not open
exp :- 1-2 yr (fresher can also apply if he / she have strong knowledge of matlab )

For apply send your latest resume at vlsiengitech@gmail.com

Approval to establish two Semiconductor Wafer Fabrication Manufacturing Facilities in India

Approval to establish two Semiconductor Wafer Fabrication Manufacturing Facilities in India

The Cabinet has approved setting up of two Semiconductor Wafer Fabrication (FAB) Manufacturing Facilities in India. These FAB units are to be set up by two business consortia, with the following broad project parameters:
(i) M/s Jaiprakash Associates Limited (with IBM, USA and Tower Semiconductor Limited, Israel as partners)
a) Project Cost: Rs 34,399 crore
b) Technology: 90/65/45/28 nm
c) Capacity: 40,000 WSPM
d) Location: Yamuna Expressway, Uttar Pradesh

(ii) M/s HSMC Technologies India Pvt. Ltd. (with ST Microelectronics and Silterra Malaysia Sdn. Bhd. as partners)
a) Project Cost: Rs 29,013 crore
b) Technology: 90/65/45/28/22 nm
c) Capacity: 40,000 WSPM
d) Location: Prantij, Gujarat

The Empowered Committee has been authorized to take all decisions to implement the FAB projects in furtherance of the decision. The proposed FABs will create direct employment of about 22,000 and indirect employment of about one lakh.

These FABs will have a big impact on the development of Electronics System Design and Manufacturing eco-system across the country. This will help set up a critical pillar required to promote Electronics System Design and Manufacturing in India. The Semiconductor Wafer Fabrication units when set up, will stimulate the flow of capital and technology, create employment opportunities, help higher value addition in the electronic products manufactured in India, reduce dependence on imports, and lead to innovation.

The following main incentives will be extended:
i. 25% subsidy on capital expenditure and tax reimbursement as admissible under Modified Special Incentive Package Scheme (M-SIPS) Policy.
ii. Exemption of Basic Customs Duty (BCD) for non-covered capital items
iii. 200% deduction on expenditure on R&D as admissible under Section 35(2AB) of the Income Tax (IT) Act.
iv. Investment linked deductions under Section 35AD of the IT Act.
v. Interest free loan of approx. Rs 5124 crore each. (Exact amount to be calculated on Detailed Project Report appraisal.)